Reference number
ISO 14701:2018
International Standard
ISO 14701:2018
Surface chemical analysis — X-ray photoelectron spectroscopy — Measurement of silicon oxide thickness
Edition 2
2018-11
Preview
ISO 14701:2018
74818
No disponible en español
Publicado (Edición 2, 2018)

ISO 14701:2018

ISO 14701:2018
74818
Idioma
Formato
CHF 96
Convertir Franco suizo (CHF) a tu moneda

Resumen

This document specifies several methods for measuring the oxide thickness at the surfaces of (100) and (111) silicon wafers as an equivalent thickness of silicon dioxide when measured using X-ray photoelectron spectroscopy. It is only applicable to flat, polished samples and for instruments that incorporate an Al or Mg X-ray source, a sample stage that permits defined photoelectron emission angles and a spectrometer with an input lens that can be restricted to less than a 6° cone semi-angle. For thermal oxides in the range 1 nm to 8 nm thickness, using the best method described in this document, uncertainties, at a 95 % confidence level, could typically be around 2 % and around 1 % at optimum. A simpler method is also given with slightly poorer, but often adequate, uncertainties.

Informaciones generales

  •  : Publicado
     : 2018-11
    : Cierre de la revisión [90.60]
  •  : 2
     : 17
  • ISO/TC 201/SC 7
    71.040.40 
  • RSS actualizaciones

¿Tiene alguna duda?

Consulte nuestras Ayuda y asistencia